Synthesis of Ni-TiN/Si3N4 nanocomposite layers using the electrodeposition method Hadi Nasbey, Esmar Budi, Leli Kusumawati
Physics Department , Universitas Negeri Jakarta, Jl. Rawamangun muka, Jakarta, Indonesia
Abstract
The synthesis of the Ni-TiN/Si3N4 nanocomposite layers was carried out. The coating process is carried out using the electrodeposition method. In the electrodeposition process, tungsten carbide (WC) is used as the working electrode. The WC is immersed in the electrolytic solution and is electrified for 5 mA for 15 minutes. During the deposition process, the temperature of the solution is maintained at 35 ° C using a hot disc. The crystal structure and phase changes formed in the WC are characterized using X-ray diffraction (XRD). The surface morphology of the layer is guaranteed by scanning electron microscopy (SEM). Based on the results of the characterization, the size of the Ni-TiN crystal is approximately 488.91 Å. The Si3N4 phase is not detected because it is amorphous. The thickness of the layer formed is approximately 805 nm.
